DLAB HB150-S1 LED Digital Single Module Dry Bath – Extreme-Temp Incubation up to 150°C | Laboratory Equipment Malaysia
Specifications
Details
DLAB HB150-S1 LED Digital Single Module Dry Bath
The DLAB HB150-S1 is a high-performance digital dry bath engineered for extreme temperature applications up to 150°C. Featuring a single interchangeable block module, external temperature sensing, and precise thermal control, it is ideal for demanding laboratory protocols requiring ultra-high heating, including specialized digestions and material testing.
Key Features & Advantages:
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Ultra-High Temperature Range: Supports an extensive temperature range from ambient +5°C to 150°C for the most demanding laboratory applications.
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Precise Temperature Control: Delivers high accuracy (±0.3°C from 25-90°C; ±0.6°C from 90-150°C) and excellent uniformity (±0.2°C at 37°C).
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External Temperature Sensor: Allows for real-time monitoring of sample temperature directly in the block for enhanced accuracy and process control.
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User-Friendly Operation: Simple knob adjustment, audible alerts, and an included block lid for temperature maintenance and contamination prevention.
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Safety Assurance: Built-in overheating protection ensures safe operation during extended high-temperature use.
Technical Specifications:
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Catalog No.: 5032101210
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Temperature Range: Ambient +5°C to 150°C
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Temperature Control Accuracy: ±0.3°C (25-90°C) | ±0.6°C (90-150°C)
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Temperature Uniformity @37°C: ±0.2°C
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Time Setting Range: 0 min to 99 h 59 min
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External Sensor: Yes
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Power: 100W
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Display: LED
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Voltage/Frequency: 110/220V, 50/60Hz
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Dimensions (W x D x H): 290 x 210 x 120 mm
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Weight: 3.2 kg
Ideal For:
Specialized sample preparation, material testing, and any research or industrial application requiring precise, reliable, and safe dry heat incubation up to 150°C.
Why Choose the DLAB HB150-S1 Digital Dry Bath?
Because it offers uncompromising performance at extreme temperatures, combined with precise control and critical safety features, making it a robust solution for specialized high-heat processes.
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